Fully automatic photolithography processing equipment for large substrates
Consistent processing of photolithography is possible.
■Supports ultra-large heavy substrates of the G8.5 generation. ◎Supported substrate size: 1.3m X 1.5m X 15mm t ■Compatible with the integrated processing of the photolithography process. ◎Processing steps: LD ⇒ Development ⇒ Etching ⇒ Stripping ⇒ Cleaning ⇒ ULD ■We have multiple units in operation from various domestic manufacturers. *For more details, please refer to the PDF document or feel free to contact us. Sheet-type cleaning equipment, substrate cleaning equipment, spin cleaning equipment, semiconductor manufacturing equipment, semiconductors, cleaning equipment, resist, photoresist, photolithography process, organic EL, surface treatment, wafer stripping equipment, wafer cleaning equipment, wafer cleaning machines.
- Company：ソフエンジニアリング
- Price：Other
